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    The rapid formation of functional monolayers on silicon under mild conditions

    240472_240472.pdf (1.765Mb)
    Access Status
    Open access
    Authors
    Ciampi, S.
    Luais, E.
    James, M.
    Choudhury, M.
    Darwish, Nadim
    Gooding, J.
    Date
    2014
    Type
    Journal Article
    
    Metadata
    Show full item record
    Citation
    Ciampi, S. and Luais, E. and James, M. and Choudhury, M. and Darwish, N. and Gooding, J. 2014. The rapid formation of functional monolayers on silicon under mild conditions. Physical Chemistry Chemical Physics. 16 (17): pp. 8003-8011.
    Source Title
    Physical Chemistry Chemical Physics
    DOI
    10.1039/c4cp00396a
    ISSN
    1463-9076
    School
    Nanochemistry Research Institute
    Remarks

    This open access article is distributed under the Creative Commons license http://creativecommons.org/licenses/by/3.0/

    URI
    http://hdl.handle.net/20.500.11937/27452
    Collection
    • Curtin Research Publications
    Abstract

    We report on an exceedingly mild chemical functionalization of hydrogen-terminated Si(100) with unactivated and unprotected bifunctional α,ω-dialkynes. Monolayer formation occurs rapidly in the dark, and at room temperature, from dilute solutions of an aromatic-conjugated acetylene. The method addresses the poor reactivity of p-type substrates under mild conditions. We suggest the importance of several factors, including an optimal orientation for electron transfer between the adsorbate and the Si surface, conjugation of the acetylenic function with a π-system, as well as the choice of a solvent system that favors electron transfer and screens Coulombic interactions between surface holes and electrons. The passivated Si(100) electrode is amenable to further functionalization and shown to be a viable model system for redox studies at non-oxide semiconductor electrodes in aqueous solutions.

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