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dc.contributor.authorLebedev, Maxim
dc.contributor.authorAkedo, J.
dc.contributor.authorIto, T.
dc.date.accessioned2017-01-30T10:34:02Z
dc.date.available2017-01-30T10:34:02Z
dc.date.created2010-03-01T20:02:10Z
dc.date.issued2004
dc.identifier.citationLebedev, Maxim and Akedo, Jun and Ito, Tomokazu. 2004. Substrate heating effects on hardness of an x-A12O3 thick film formed by aerosol deposition method. Journal of Crystal Growth. 275 (1-2): pp. e1301-e1306.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/3788
dc.identifier.doi10.1016/j.jcrysgro.2004.11.109
dc.publisherElsevier Science BV
dc.titleSubstrate heating effects on hardness of an x-A12O3 thick film formed by aerosol deposition method
dc.typeJournal Article
dcterms.source.volume275
dcterms.source.startPagee1301
dcterms.source.endPagee1306
dcterms.source.issn00220248
dcterms.source.titleJournal of Crystal Growth
curtin.note

The link to the journal’s home page is: http://www.elsevier.com/wps/find/journaldescription.cws_home/505670/description#description. Copyright © 2004 Elsevier B.V. All rights reserved

curtin.accessStatusFulltext not available
curtin.facultyDepartment of Exploration Geophysics
curtin.facultyFaculty of Science and Engineering
curtin.facultyWA School of Mines


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