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dc.contributor.authorMemar, Amir
dc.contributor.authorPhan, Chi
dc.contributor.authorTade, Moses
dc.date.accessioned2017-01-30T14:11:44Z
dc.date.available2017-01-30T14:11:44Z
dc.date.created2014-09-23T20:00:18Z
dc.date.issued2014
dc.identifier.citationMemar, A. and Phan, C. and Tade, M. 2014. Controlling particle size and photoelectrochemical properties of nanostructured WO3 with surfactants. Applied Surface Science. 305: pp. 760-767.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/38072
dc.identifier.doi10.1016/j.apsusc.2014.03.194
dc.description.abstract

Tungsten trioxide films were prepared by sol–gel method using peroxotungstic acid (PTA) as the precursor sol with Triton X-n (with n = 45, 100, 305, 405, 705) surfactants. Physical (morphology, film thickness, surface roughness and crystallite, grain and particle size) and photo-electrochemical (PEC) properties of the synthesized films were characterized. The physical characterization showed a clear correlation with surfactant size. Most importantly, the correlation between grain size and surfactant size followed a monotonic equation. Similarly, the PEC properties were strongly correlated to surfactant size. The best performance was observed with the smallest surfactants. The highest photocurrent density of 2.10 mA cm−2 at 1.6 V (vs. RHE), was produced by Triton X-45. Results presented a simple method to control the grain size and performance of WO3 semiconductor.

dc.publisherElsevier BV North-Holland
dc.subjectWO3 nanostructure
dc.subjectSurfactant
dc.subjectSol–gel method
dc.titleControlling particle size and photoelectrochemical properties of nanostructured WO3 with surfactants
dc.typeJournal Article
dcterms.source.volume305
dcterms.source.startPage760
dcterms.source.endPage767
dcterms.source.issn01694332
dcterms.source.titleApplied Surface Science
curtin.departmentDepartment of Chemical Engineering
curtin.accessStatusFulltext not available


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