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Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films

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Authors
Tucker, Mark
Czigany, Z.
Broitman, E.
Naslund, L.
Hultman, L.
Rosen, J.
Date
2014
Type
Journal Article

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Tucker, M. and Czigany, Z. and Broitman, E. and Naslund, L. and Hultman, L. and Rosen, J. 2014. Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films. Journal of Applied Physics. 115.
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Journal of Applied Physics
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Copyright (2014) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Tucker, M. and Czigany, Z. and Broitman, E. and Naslund, L. and Hultman, L. and Rosen, J. 2014. Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films. Journal of Applied Physics. 115; and may be found at http://doi.org/10.1063/1.4871179

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Abstract

Carbon and carbon nitride films (CN x , 0 ≤ x ≤ 0.26) were deposited by filtered pulsed cathodic arc and were investigated using transmission electron microscopy and X-ray photoelectron spectroscopy. A “fullerene-like” (FL) structure of ordered graphitic planes, similar to that of magnetron sputtered FL-CN x films, was observed in films deposited at 175 °C and above, with N2 pressures of 0 and 0.5 mTorr. Higher substrate temperatures and significant nitrogen incorporation are required to produce similar FL structure by sputtering, which may, at least in part, be explained by the high ion charge states and ion energies characteristic of arc deposition. A gradual transition from majority sp3-hybridized films to sp2 films was observed with increasing substrate temperature. High elastic recovery, an attractive characteristic mechanical property of FL-CN x films, is evident in arc-deposited films both with and without nitrogen content, and both with and without FL structure.