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    High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study

    Access Status
    Fulltext not available
    Authors
    Low, It-Meng (Jim)
    Pang, W.
    Kennedy, S.
    Smith, R.
    Date
    2011
    Type
    Journal Article
    
    Metadata
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    Citation
    Low, I.M. and Pang, W.K. and Kennedy, S.J. and Smith, R.I. 2011. High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study. Journal of European Ceramic Society. 31: pp. 159-166.
    Source Title
    Journal of European Ceramic Society
    DOI
    10.1016/j.jeurceramsoc.2010.09.014
    ISSN
    0955-2219
    School
    Department of Imaging and Applied Physics
    URI
    http://hdl.handle.net/20.500.11937/41414
    Collection
    • Curtin Research Publications
    Abstract

    The susceptibility of Ti2AlN and Ti4AlN3 to high-temperature thermal dissociation in a dynamic environment of high-vacuum has been investigated using in situ neutron diffraction. Under high vacuum, these ternary nitrides decomposed above 1400 °C through the sublimation of Al, and possibly Ti, to form a surface coating of TiNx (0.5=x=0.75). The kinetics of isothermal phase decomposition were modelled using the Avrami equation and the Avrami exponents (n) of isothermal decomposition of Ti2AlN and Ti4AlN3 were determined to be 0.62 and 0.18, respectively. The characteristics of thermal stability and phase transitions in Ti2AlN and Ti4AlN3 are compared in terms of the rate of decomposition, phase relations and microstructures.

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