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dc.contributor.authorRadny, M.
dc.contributor.authorSmith, P.
dc.contributor.authorReusch, T.
dc.contributor.authorWarschkow, O.
dc.contributor.authorMarks, Nigel
dc.contributor.authorShi, H.
dc.contributor.authorMcKenzie, D.
dc.contributor.authorSchofield, S.
dc.contributor.authorCurson, N.
dc.contributor.authorSimmons, M.
dc.date.accessioned2017-01-30T14:58:43Z
dc.date.available2017-01-30T14:58:43Z
dc.date.created2014-10-08T03:10:53Z
dc.date.issued2007
dc.identifier.citationRadny, M. and Smith, P. and Reusch, T. and Warschkow, O. and Marks, N. and Shi, H. and McKenzie, D. et al. 2007. Single P and As dopants in the Si(001) surface. The Journal of Chemical Physics. 127: pp. 184706-1-184706-9.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/42294
dc.publisherAmerican Institute of Physics
dc.titleSingle P and As dopants in the Si(001) surface
dc.typeJournal Article
dcterms.source.volume127
dcterms.source.startPage184706
dcterms.source.endPage1
dcterms.source.issn10897690
dcterms.source.titleThe Journal of Chemical Physics
curtin.accessStatusFulltext not available


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