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dc.contributor.authorRietwyk, K.
dc.contributor.authorWong, S.
dc.contributor.authorCao, L.
dc.contributor.authorO’Donnell, Kane
dc.contributor.authorLey, L.
dc.contributor.authorWee, A.
dc.contributor.authorPakes, C.
dc.date.accessioned2017-01-30T15:35:00Z
dc.date.available2017-01-30T15:35:00Z
dc.date.created2014-08-31T20:00:27Z
dc.date.issued2013
dc.identifier.citationRietwyk, K. and Wong, S. and Cao, L. and O’Donnell, K. and Ley, L. and Wee, A. and Pakes, C. 2013. Work function and electron affinity of the fluorine-terminated (100) diamond surface. Applied Physics Letters. 102: Article ID 091604.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/47684
dc.identifier.doi10.1063/1.4793999
dc.description.abstract

The work function and electron affinity of fluorine-terminated (100) diamond surfaces prepared by exposure to dissociated XeF2 have been determined using synchrotron-based photoemission. After vacuum annealing to 350°C a clean, monofluoride terminated C(100):F surface was obtained for which an electron affinity of 2.56 eV was measured. This is the highest electron affinity reported for any diamond surface termination so far, and it exceeds the value predicted by recent density functional theory calculations by 0.43 eV. The work function of 7.24 eV measured for the same surface places the Fermi energy of 0.79 eV above the valence band maximum.

dc.publisherAmerican Institute of Physics
dc.titleWork function and electron affinity of the fluorine-terminated (100) diamond surface
dc.typeJournal Article
dcterms.source.volume102
dcterms.source.number9
dcterms.source.issn00036951
dcterms.source.titleApplied Physics Letters
curtin.departmentDepartment of Imaging and Applied Physics
curtin.accessStatusFulltext not available


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