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    Photosensitized dimerization in pyrimidine-based thin solid films

    Access Status
    Fulltext not available
    Authors
    Patra, A.
    Ralston, J.
    Sedev, Rossen
    Zhou, J.
    Date
    2011
    Type
    Journal Article
    
    Metadata
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    Citation
    Patra, A. and Ralston, J. and Sedev, R. and Zhou, J. 2011. Photosensitized dimerization in pyrimidine-based thin solid films. Thin Solid Films. 519 (18): pp. 6010-6014.
    Source Title
    Thin Solid Films
    DOI
    10.1016/j.tsf.2011.04.070
    ISSN
    0040-6090
    School
    Department of Chemical Engineering
    URI
    http://hdl.handle.net/20.500.11937/54708
    Collection
    • Curtin Research Publications
    Abstract

    Thin solid films of thymine and uracil derivatives, incorporating a photosensitizer in the film, were prepared on quartz surfaces using a dip-coating technique. Photosensitized dimerization in these thin solid films was investigated in this study and compared with the conventional, non-photosensitized reaction. Both carbonyl and p-aminobenzoic compounds were selected as photosensitizers. It was found that only p-aminobenzoic compounds such as p-aminobenzoic acid and N-dodecyl p-aminobenzoic acid were effective in causing the photosensitized dimerization of thymine, upon exposure to light of wavelength 313 nm. Uracil surfaces, however, do not photodimerize under these conditions. The concentration of photosensitizer and the solvent selected in the dip-coating process strongly influenced the dimerization process. The reaction rate of sensitized dimerization follows a pseudo-first order reaction.

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