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dc.contributor.authorPang, W.
dc.contributor.authorLow, It-Meng
dc.contributor.authorHanna, J.
dc.date.accessioned2017-01-30T12:05:50Z
dc.date.available2017-01-30T12:05:50Z
dc.date.created2012-03-26T20:01:25Z
dc.date.issued2010
dc.identifier.citationPang, W.K. and Low, I.M. and Hanna, J.V. 2010. Detection of amorphous silica in air-oxidized Ti3SiC2 at 500-1000°C. Materialy Ceramiczne /Ceramic Materials. 62 (3): pp. 235-238.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/59706
dc.description.abstract

In this paper we describe the use of secondary-ion mass spectrometry (SIMS) and nuclear magnetic resonance (NMR) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dynamic SIMS. A duplex structure with an outer layer of TiO2 and an inner mixture layer of SiO2 and TiO2 was observed. Results of NMR verify for the first time the direct evidence of amorphous silica formation during the oxidation of Ti3SiC2 at the temperature range 500-1000°C.

dc.publisherPolskie Towarzystwo Ceramiczne
dc.relation.urihttp://www.ptcer.pl/mccm/en/article-details/62/3/255
dc.subjectTi3SiC2
dc.subjectamorphous silica
dc.subjectoxidation
dc.subjectSIMS
dc.subjectNMR
dc.titleDetection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C
dc.typeJournal Article
dcterms.source.volume62
dcterms.source.number3
dcterms.source.startPage235
dcterms.source.endPage238
dcterms.source.issn16443470
dcterms.source.titleMaterialy Ceramiczne / Ceramic Materials
curtin.departmentDepartment of Imaging and Applied Physics
curtin.accessStatusFulltext not available


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