Path planning and parameter optimization of uniform removal in active feed polishing
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© Society of Photo-Optical Instrumentation Engineers. A high-quality ultrasmooth surface is demanded in short-wave optical systems. However, the existing polishing methods have difficulties meeting the requirement on spherical or aspheric surfaces. As a new kind of small tool polishing method, active feed polishing (AFP) could attain a surface roughness of less than 0.3 nm (RMS) on spherical elements, although AFP may magnify the residual figure error or mid-frequency error. The purpose of this work is to propose an effective algorithm to realize uniform removal of the surface in the processing. At first, the principle of the AFP and the mechanism of the polishing machine are introduced. In order to maintain the processed figure error, a variable pitch spiral path planning algorithm and the dwell time-solving model are proposed. For suppressing the possible mid-frequency error, the uniformity of the synthesis tool path, which is generated by an arbitrary point at the polishing tool bottom, is analyzed and evaluated, and the angular velocity ratio of the tool spinning motion to the revolution motion is optimized. Finally, an experiment is conducted on a convex spherical surface and an ultrasmooth surface is finally acquired. In conclusion, a high-quality ultrasmooth surface can be successfully obtained with little degradation of the figure and mid-frequency errors by the algorithm.
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