Influence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films
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The influence of the substrate wetting properties on the grid assisted deposition of tris-(8-hydroxyquinolinato)aluminum(Ill) (Alq(3)) Onto Si/SiOx Surfaces was investigated. Different degrees of hydrophilicity/hydrophobicity on the Si/SiOx were obtained by changing the surface chemical functionalities with wet treatments. We observed that the deposited Alq(3) films can be spatially controlled and assembled either into continuous grid-like stripes or ordered dots depending upon the wetting properties of the substrate.
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