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dc.contributor.authorMassi, Massimiliano
dc.contributor.authorCavallini, M.
dc.contributor.authorBiscarini, F.
dc.date.accessioned2017-01-30T12:04:31Z
dc.date.available2017-01-30T12:04:31Z
dc.date.created2014-10-08T02:29:18Z
dc.date.issued2009
dc.identifier.citationMassi, M. and Cavallini, M. and Biscarini, F. 2009. Influence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films. Surface Science. 603 (3): pp. 503-506.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/17852
dc.description.abstract

The influence of the substrate wetting properties on the grid assisted deposition of tris-(8-hydroxyquinolinato)aluminum(Ill) (Alq(3)) Onto Si/SiOx Surfaces was investigated. Different degrees of hydrophilicity/hydrophobicity on the Si/SiOx were obtained by changing the surface chemical functionalities with wet treatments. We observed that the deposited Alq(3) films can be spatially controlled and assembled either into continuous grid-like stripes or ordered dots depending upon the wetting properties of the substrate.

dc.publisherElsevier Science BV
dc.subjectSTATES
dc.subjectSINGLE-MOLECULE MAGNETS
dc.subjectFABRICATION
dc.subjectPATTERNS
dc.subjectCONJUGATED POLYMERS
dc.subjectSelf-organization
dc.subjectSURFACE
dc.subjectMICROSTRUCTURES
dc.subjectUnconventional lithography
dc.subjectAG(111)
dc.subjectGrid assisted deposition
dc.subjectMORPHOLOGY
dc.subjectARRAYS
dc.titleInfluence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films
dc.typeJournal Article
dcterms.source.volume603
dcterms.source.number3
dcterms.source.startPage503
dcterms.source.endPage506
dcterms.source.issn00396028
dcterms.source.titleSurface Science
curtin.accessStatusFulltext not available


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