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    Effect of indium ion implantation on crystallization kinetics and phase transformation of anodized titania nanotubes using in-situ high-temperature radiation diffraction

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    Authors
    Albetran, H.
    Low, It Meng
    Date
    2016
    Type
    Journal Article
    
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    Citation
    Albetran, H. and Low, I.M. 2016. Effect of indium ion implantation on crystallization kinetics and phase transformation of anodized titania nanotubes using in-situ high-temperature radiation diffraction. Journal of Materials Research. 31 (11): pp. 1588-1595.
    Source Title
    Journal of Materials Research
    DOI
    10.1557/jmr.2016.83
    ISSN
    0884-2914
    School
    Department of Physics and Astronomy
    URI
    http://hdl.handle.net/20.500.11937/20207
    Collection
    • Curtin Research Publications
    Abstract

    Copyright © Materials Research Society 2016.Titania nanotube arrays were synthesized electrochemically by anodization of titanium foils, and the synthesized titania nanotubes were then implanted with indium ions. The effect of In-ions implantation on crystallization and phase transformation of titania was investigated using in-situ high-temperature X-ray diffraction and synchrotron radiation diffraction from room temperature to 1000 °C. Diffraction results show that crystalline anatase first appeared at 400 °C in both the non-implanted and the In-implanted materials. The temperature at which crystalline rutile temperature appeared was 600 °C for non-implanted materials and 700 °C for In-implanted materials, and the indium implantation inhibited the anatase-to-rutile transformation. Although In3+ is expected to increase oxygen vacancy concentration and then the rate of titania transformation, the observations are consistent with implanted In-ions occupying the Ti sublattice substitutionally and then inhibiting the transformation. The relatively difficult anatase-to-rutile transformation in the In-implanted material appears to result from the relatively large In3+ radius (0.080 nm). The In3+ partly replaces the Ti4+ (0.061 nm), which provides a greater structural rigidity and prevents relaxation in the Ti bonding environment.

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