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dc.contributor.authorChen, Q.
dc.contributor.authorMao, W.
dc.contributor.authorZhou, Y.
dc.contributor.authorLu, Chungsheng
dc.date.accessioned2017-01-30T15:36:56Z
dc.date.available2017-01-30T15:36:56Z
dc.date.created2010-10-28T20:02:54Z
dc.date.issued2010
dc.identifier.citationChen, Q. and Mao, W.G. and Zhou, Y.C. and Lu, C. 2010. Effect of Young's modulus evolution on residual stress measurement of thermal barrier coatings by X-ray diffraction. Applied Surface Science. 256 (23): pp. 7311-7315.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/48014
dc.identifier.doi10.1016/j.apsusc.2010.05.071
dc.publisherElsevier BV North-Holland
dc.titleEffect of Young's modulus evolution on residual stress measurement of thermal barrier coatings by X-ray diffraction
dc.typeJournal Article
dcterms.source.volume256
dcterms.source.number23
dcterms.source.startPage7311
dcterms.source.endPage7315
dcterms.source.issn01694332
dcterms.source.titleApplied Surface Science
curtin.note

The link to the journal’s home page is: http://www.elsevier.com/wps/find/journaldescription.cws_home/505669/description#description. Copyright © 2010 Elsevier B.V. All rights reserved

curtin.accessStatusOpen access
curtin.facultySchool of Engineering
curtin.facultyFaculty of Science and Engineering
curtin.facultyDepartment of Mechanical Engineering


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