Show simple item record

dc.contributor.authorMcKenzie, W.
dc.contributor.authorQuadir, Md Zakaria
dc.contributor.authorGass, M.
dc.contributor.authorMunroe, P.
dc.date.accessioned2017-07-27T05:20:40Z
dc.date.available2017-07-27T05:20:40Z
dc.date.created2017-07-26T11:11:20Z
dc.date.issued2011
dc.identifier.citationMcKenzie, W. and Quadir, M.Z. and Gass, M. and Munroe, P. 2011. Focused Ion beam implantation of diamond. Diamond and Related Materials. 20 (8): pp. 1125-1128.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/54354
dc.identifier.doi10.1016/j.diamond.2011.06.022
dc.description.abstract

The interaction between diamond and a 30 kV Ga+ focused ion beam, has been studied. Electron backscattered diffraction identified the critical dose for amorphisation of the diamond surface at 2 × 10 14 Ga+/cm2. Scanning transmission electron microscopy identified a 35 nm amorphous carbon layer which, at higher doses, can swell up to 31% its original volume and accommodate a significant quantity of gallium. Electron energy loss and energy dispersive X-ray spectroscopy further characterised this layer and identified both excess hydrogen and oxygen contained within a stable amorphous carbon structure. © 2011 Elsevier B.V. All rights reserved.

dc.publisherElsevier
dc.titleFocused Ion beam implantation of diamond
dc.typeJournal Article
dcterms.source.volume20
dcterms.source.number8
dcterms.source.startPage1125
dcterms.source.endPage1128
dcterms.source.issn0925-9635
dcterms.source.titleDiamond and Related Materials
curtin.departmentJohn de Laeter Centre
curtin.accessStatusFulltext not available


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record