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Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography

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Das, Narottam
Karar, A.
Vasiliev, M.
Tan, C.
Alameh, K.
Lee, Y.
Date
2011
Type
Journal Article

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Das, N. and Karar, A. and Vasiliev, M. and Tan, C. and Alameh, K. and Lee, Y. 2011. Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography. Optics Communications. 284 (6): pp. 1694-1700.
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Optics Communications
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Department of Electrical and Computer Engineering
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Abstract

We present finite-difference time-domain (FDTD) analysis results of light absorption enhancement factor dependence on the profile shape of nano-gratings etched into the surfaces of metal-semiconductor-metal photodetector (MSM-PD) structures. The MSM-PDs patterned by nano-gratings are optimized geometrically, improving the light absorption near the design wavelength through plasmon-assisted electric field concentration effects. FDTD simulation results show about 50 times light absorption enhancement prediction for 850 nm light due to improved optical signal propagation through the nano-gratings in comparison with the conventional MSM-PD designs employing only a subwavelength aperture. We also report on the nano-grating profile shapes obtained typically in our experiments using focused ion-beam lithography and discuss the dependency of light absorption enhancement on the geometric parameters of nano-gratings inscribed into MSM-PDs. © 2010 Elsevier B.V. All rights reserved.