Curtin University Homepage
  • Library
  • FAQ
    • Log in

    espace - Curtin’s institutional repository

    JavaScript is disabled for your browser. Some features of this site may not work without it.
    View Item 
    • espace Home
    • espace
    • Curtin Research Publications
    • View Item
    • espace Home
    • espace
    • Curtin Research Publications
    • View Item

    Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography

    Access Status
    Fulltext not available
    Authors
    Das, Narottam
    Karar, A.
    Vasiliev, M.
    Tan, C.
    Alameh, K.
    Lee, Y.
    Date
    2011
    Collection
    • Curtin Research Publications
    Type
    Journal Article
    Metadata
    Show full item record
    Abstract

    We present finite-difference time-domain (FDTD) analysis results of light absorption enhancement factor dependence on the profile shape of nano-gratings etched into the surfaces of metal-semiconductor-metal photodetector (MSM-PD) structures. The MSM-PDs patterned by nano-gratings are optimized geometrically, improving the light absorption near the design wavelength through plasmon-assisted electric field concentration effects. FDTD simulation results show about 50 times light absorption enhancement prediction for 850 nm light due to improved optical signal propagation through the nano-gratings in comparison with the conventional MSM-PD designs employing only a subwavelength aperture. We also report on the nano-grating profile shapes obtained typically in our experiments using focused ion-beam lithography and discuss the dependency of light absorption enhancement on the geometric parameters of nano-gratings inscribed into MSM-PDs. © 2010 Elsevier B.V. All rights reserved.

    Citation
    Das, N. and Karar, A. and Vasiliev, M. and Tan, C. and Alameh, K. and Lee, Y. 2011. Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography. Optics Communications. 284 (6): pp. 1694-1700.
    Source Title
    Optics Communications
    URI
    http://hdl.handle.net/20.500.11937/55219
    DOI
    10.1016/j.optcom.2010.11.065
    Department
    Department of Electrical and Computer Engineering

    Related items

    Showing items related by title, author, creator and subject.

    • Optimization of light transmission efficiency for nano-grating assisted MSM-PDs by varying physical parameters
      Masouleh, F.; Das, Narottam; Mashayekhi, H. (2014)
      Metal–semiconductor–metal photodetectors (MSM-PDs) are utilized for suitable nano-structured fabrications that can play an important role for the development of future high-speed devices to achieve very high responsivit ...
    • Nano-structured metal-semiconductor-metal photo-detectors for enhanced light absorption
      Das, Narottam; Masouleh, F.; Mashayekhi, H. (2012)
      Nano-structured metal-semiconductor-metal photodetectors (MSM-PDs) are enable to assist in future high-speed communication devices achieving high responsivity-bandwidth characteristics. Finite difference time-domain (FDTD) ...
    • Analysis of plasmonics-based MSM photodetector with optimized parameters
      Masouleh, Farzaneh; Mashayekhi, Hamid; Das, Narottam (2013)
      Finite difference time-domain (FDTD) method is used to simulate the light absorption in a novel plasmonic-based photodetector with nano-gratings. Slit width is one of the effective parameters for the light absorption ...
    Advanced search

    Browse

    Communities & CollectionsIssue DateAuthorsTitlesSubjectsDocument TypesThis CollectionIssue DateAuthorsTitlesSubjectsDocument Types

    My Account

    Log in

    Statistics

    Most Popular ItemsStatistics by CountryMost Popular Authors

    Connect with Curtin

    • 
    • 
    • 
    • 
    • 
    • 
    • 

    CRICOS Provider Code: 00301JABN: 99 143 842 569TEQSA: PRV12158

    Send FeedbackContact Us
    DSpace software copyright © 2002-2015  DuraSpace