Characterisation of the growth of a carbonaceous film on silicon

Beardmore, Joshua; Palmer, A.; Fabrie, C.; Van Leeuwen, K.; Sang, R.

doi:10.1016/j.tsf.2011.09.073

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Authors

Beardmore, Joshua

Palmer, A.

Fabrie, C.

Van Leeuwen, K.

Sang, R.

Date

2012

Type

Journal Article

Metadata

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Citation

Beardmore, J. and Palmer, A. and Fabrie, C. and Van Leeuwen, K. and Sang, R. 2012. Characterisation of the growth of a carbonaceous film on silicon. Thin Solid Films. 520 (7): pp. 2414-2417.

Source Title

Thin Solid Films

DOI

10.1016/j.tsf.2011.09.073

ISSN

0040-6090

School

School of Earth and Planetary Sciences (EPS)

URI

http://hdl.handle.net/20.500.11937/66387

Collection

Curtin Research Publications

Abstract

In this paper we present the first characterisation of growth of a carbonaceous film on a silicon substrate exposed to a metastable atom beam using an in situ rotating polariser ellipsometer. The initial deposition of oil due to a background partial pressure in vacuum is investigated. Subsequent exposure of the deposited oil to a high flux metastable neon (Ne*) beam results in cross-linking of the oil film, creating a polymerised carbonaceous layer. Values for the mean residence time, polymerisation cross-section, and desorption cross-section are calculated and compared to similar studies performed for ion bombardment. Simple estimates can provide reasonable values for application of the theory to other systems. © 2011 Elsevier B.V. All rights reserved.