Show simple item record

dc.contributor.authorBeardmore, Joshua
dc.contributor.authorPalmer, A.
dc.contributor.authorFabrie, C.
dc.contributor.authorVan Leeuwen, K.
dc.contributor.authorSang, R.
dc.identifier.citationBeardmore, J. and Palmer, A. and Fabrie, C. and Van Leeuwen, K. and Sang, R. 2012. Characterisation of the growth of a carbonaceous film on silicon. Thin Solid Films. 520 (7): pp. 2414-2417.

In this paper we present the first characterisation of growth of a carbonaceous film on a silicon substrate exposed to a metastable atom beam using an in situ rotating polariser ellipsometer. The initial deposition of oil due to a background partial pressure in vacuum is investigated. Subsequent exposure of the deposited oil to a high flux metastable neon (Ne*) beam results in cross-linking of the oil film, creating a polymerised carbonaceous layer. Values for the mean residence time, polymerisation cross-section, and desorption cross-section are calculated and compared to similar studies performed for ion bombardment. Simple estimates can provide reasonable values for application of the theory to other systems. © 2011 Elsevier B.V. All rights reserved.

dc.publisherElsevier S.A.
dc.titleCharacterisation of the growth of a carbonaceous film on silicon
dc.typeJournal Article
dcterms.source.titleThin Solid Films
curtin.departmentSchool of Earth and Planetary Sciences (EPS)
curtin.accessStatusFulltext not available

Files in this item


There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record