Released micromachined beams utilizing laterally uniform porosity porous silicon

Sun, Xiao; Keating, Adrian; Parish, Giacinta

doi:10.1186/1556-276X-9-426

1556-276X-9-426.pdf (1.721Mb)

Access Status

Open access

Authors

Sun, Xiao

Keating, Adrian

Parish, Giacinta

Date

2014

Type

Journal Article

Metadata

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Citation

Sun, X. and Keating, A. and Parish, G. 2014. Released micromachined beams utilizing laterally uniform porosity porous silicon. Nanoscale Research Letters. 9. Article No. 426.

Source Title

Nanoscale Research Letters

DOI

10.1186/1556-276X-9-426

ISSN

1931-7573

Faculty

Faculty of Science and Engineering

School

John de Laeter Centre (JdLC)

Rights

http://creativecommons.org/licenses/by/4.0/

Remarks

This is an article published in Nanoscale Research Letters, available online at: http://doi.org/10.1186/1556-276X-9-426.

URI

http://hdl.handle.net/20.500.11937/79814

Collection

Curtin Research Publications

Abstract

Abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces.

PACS: 81.16.-c; 81.16.Nd; 81.16.Rf

Except where otherwise noted, this item's license is described as http://creativecommons.org/licenses/by/4.0/