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dc.contributor.authorSun, Xiao
dc.contributor.authorKeating, Adrian
dc.contributor.authorParish, Giacinta
dc.date.accessioned2020-07-01T03:01:36Z
dc.date.available2020-07-01T03:01:36Z
dc.date.issued2014
dc.identifier.citationSun, X. and Keating, A. and Parish, G. 2014. Released micromachined beams utilizing laterally uniform porosity porous silicon. Nanoscale Research Letters. 9. Article No. 426.
dc.identifier.urihttp://hdl.handle.net/20.500.11937/79814
dc.identifier.doi10.1186/1556-276X-9-426
dc.description.abstract

© 2014, Sun et al.; licensee Springer.

Abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces.

PACS: 81.16.-c; 81.16.Nd; 81.16.Rf

dc.publisherSpringer New York
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.titleReleased micromachined beams utilizing laterally uniform porosity porous silicon
dc.typeJournal Article
dcterms.source.volume9
dcterms.source.number1
dcterms.source.issn1931-7573
dcterms.source.titleNanoscale Research Letters
dc.date.updated2020-07-01T03:01:34Z
curtin.note

This is an article published in Nanoscale Research Letters, available online at: http://doi.org/10.1186/1556-276X-9-426.

curtin.departmentJohn de Laeter Centre (JdLC)
curtin.accessStatusOpen access
curtin.facultyFaculty of Science and Engineering
curtin.contributor.orcidSun, Xiao [0000-0002-5770-0943]
dcterms.source.eissn1556-276X


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