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    Organic Monolayers on Si(211) for Triboelectricity Generation: Etching Optimization and Relationship between the Electrochemistry and Current Output

    93739.pdf (2.060Mb)
    Access Status
    Open access
    Authors
    Hurtado, Carlos
    Lyu, Xin
    Ferrie, Stuart
    Le Brun, A.P.
    Macgregor, M.
    Ciampi, Simone
    Date
    2022
    Type
    Journal Article
    
    Metadata
    Show full item record
    Citation
    Hurtado, C. and Lyu, X. and Ferrie, S. and Le Brun, A.P. and Macgregor, M. and Ciampi, S. 2022. Organic Monolayers on Si(211) for Triboelectricity Generation: Etching Optimization and Relationship between the Electrochemistry and Current Output. ACS Applied Nano Materials. 5 (10): pp. 14263-14274.
    Source Title
    ACS Applied Nano Materials
    DOI
    10.1021/acsanm.2c02006
    Faculty
    Faculty of Science and Engineering
    School
    School of Molecular and Life Sciences (MLS)
    Funding and Sponsorship
    http://purl.org/au-research/grants/arc/DP190100735
    http://purl.org/au-research/grants/arc/FT190100148
    http://purl.org/au-research/grants/arc/FT200100301
    Remarks

    This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Nano Materials, copyright © American Chemical Society, after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsanm.2c02006.

    URI
    http://hdl.handle.net/20.500.11937/93934
    Collection
    • Curtin Research Publications
    Abstract

    Triboelectric nanogenerators (TENGs) based on sliding silicon-organic monolayer-metal Schottky diodes are an emerging autonomous direct-current (DC) current supply technology. Herein, using conductive atomic force microscopy and electrochemical techniques, we explore the optimal etching conditions toward the preparation of DC TENGs on Si(211), a readily available, highly conductive, and underexplored silicon crystallographic cut. We report optimized conditions for the chemical etching of Si(211) surfaces with subnanometer root-mean-square roughness, explore Si(211) chemical passivation, and unveil a relationship between the electrochemical charge-transfer behavior at the silicon-liquid interface and the zero-applied bias current output from the corresponding dynamic silicon-organic monolayer-platinum system. The overall aim is to optimize the etching and functionalization of the relatively underexplored Si(211) facet, toward its application in out-of-equilibrium Schottky diodes as autonomous power supplies. We also propose the electrochemical behavior of surface-confined redox couples as a diagnostic tool to anticipate whether or not a given surface will perform satisfactorily when used in a TENG design.

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