View Item 

Comment on "On the tensile strength distribution of multiwalled carbon nanotubes" [Appl. Phys. Lett. 87, 203106 (2005)]

Access Status
Open access via publisher
Authors
Lu, Chunsheng
Date
2008
Type
Journal Article

Metadata
Show full item record
Citation
Lu, Chunsheng. 2008. Comment on "On the tensile strength distribution of multiwalled carbon nanotubes" [Appl. Phys. Lett. 87, 203106 (2005)]. Applied Physics Letters. 92 (20): pp. 206101-1-206101-2.
Source Title
Applied Physics Letters
DOI
ISSN
Faculty
Faculty of Science and Engineering
Department of Mechanical Engineering
School of Civil and Mechanical Engineering
Remarks

Copyright © 2008 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

This article appeared in Appl. Phys. Lett. / Volume 92 / Issue 20 / COMMENTS published 19 May 2008 and may be found at: http://link.aip.org/link/?APPLAB/92/206101/1

URI
Collection
Abstract

In a recent letter, Barber, Andrews, Schadler, and Wagner, Appl. Phys. Lett. 87, 203106 (2005). indicated that Weibull-Poisson statistics could accurately model the nanotube tensile strength data, and then concluded that the apparent strengthening mechanism in a multiwalled carbon nanotube (MWCNT) grown by chemical vapor deposition (CVD) is most likely caused by an enhanced interaction between the walls of the nanotube. In this comment, we show that their conclusion seems to be inconsistent with the assumption introduced in the data analysis by using a two-parameter Weibull distribution. Further statistical analysis provides a new explanation on the scattered strengths of MWCNTs. The effectiveness of Weibull-Poisson statistics at nanoscales is also discussed. ©2008 American Institute of Physics